Mueller Matrix Ellipsometer
Mueller Matrix Ellipsometer
Function Introduction:
This instrument is designed for the analysis of optical properties and structural characteristics of various functional materials and bulk materials within the fields of nanofabrication, nanomaterials science, and nanobiology. Its applications include the analysis of optical constants for informational optoelectronic materials and devices. Measurement objects encompass metals, semiconductors, superconductors, insulators, amorphous solids, magnetic materials, electro-optic materials, nonlinear materials, as well as isotropic and anisotropic materials. It is also capable of analyzing surface and interface properties, thickness, and roughness of thin-film materials. Furthermore, by utilizing optical constants, it enables the characterization, measurement, and analysis of the composition and structure of various functional materials.
Main Technical Parameters:
1. Capable of one-time measurement of the full 4x4 Mueller matrix (all 16 elements).
2. Spectral range: 193 - 1690 nm
3. Angle of incidence variation range: 45° - 90°.
4. Micro-spot diameter: 200 μm.
5. Single-point measurement time: 1 - 15 s.
6. Repetitive measurement error: < 0.002 nm.